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Derniers dépôts
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Simon Chouteau, L. Stafford, Agnès Granier, Antoine Goullet, Mireille Richard-Plouet. Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization. Langmuir, 2024, 40 (6), pp.3015-3023. ⟨10.1021/acs.langmuir.3c03176⟩. ⟨hal-04549282⟩
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Issraa Shahine, Quentin Hatte, Maxime Harnois, Pierre-Yves Tessier. Large Area Freestanding Au Nanoporous Ultrathin Films Transfer Printed on Bendable Substrates and 3D Surfaces for Flexible Electronics. ACS Applied Electronic Materials, 2024, 6 (4), pp.2281-2288. ⟨10.1021/acsaelm.3c01771⟩. ⟨hal-04552765⟩
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Pascal Bargiela, Vincent Fernandez, Christophe Cardinaud, John Walton, Mark Greiner, et al.. Towards a reliable assessment of charging effects during surface analysis: Accurate spectral shapes of ZrO2 and Pd/ZrO2 via X-ray Photoelectron Spectroscopy. Applied Surface Science, 2021, 566, pp.150728. ⟨10.1016/j.apsusc.2021.150728⟩. ⟨hal-03355769⟩
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Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cédric Mannequin, et al.. Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors. Journal of Vacuum Science & Technology A, 2024, 42 (2), pp.023405. ⟨10.1116/5.0177028⟩. ⟨hal-04423908⟩
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Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoît Corraze, et al.. Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1–xVx)2O3. ACS Applied Materials & Interfaces, 2023, 15 (47), pp.54611-54621. ⟨10.1021/acsami.3c09387⟩. ⟨hal-04361024⟩
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J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, et al.. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 2023, 41 (6), pp.063003. ⟨10.1116/6.0002857⟩. ⟨hal-04299303⟩
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T Meyer, A Girard, M Bouška, E Baudet, M Baillieul, et al.. Mass spectrometry and in situ x-ray photoelectron spectroscopy investigations of organometallic species induced by the etching of germanium, antimony and selenium in a methane-based plasma. Plasma Sources Science and Technology, 2023, 32 (8), pp.085003. ⟨10.1088/1361-6595/aceaa5⟩. ⟨hal-04186877⟩
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Anthony Valero, Adrien Mery, Dorian Gaboriau, Marc Dietrich, Maggie Fox, et al.. Redefining high-k dielectric materials vision at nanoscale for energy storage: A new electrochemically active protection barrier. Electrochimica Acta, 2021, 389, pp.138727. ⟨10.1016/j.electacta.2021.138727⟩. ⟨hal-03355843⟩
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Rémi Dussart, Thomas Tillocher, Gaelle Antoun, Jack Nos, Philippe Lefaucheux, et al.. Plasma cryogenic etching processes: what are the mechanisms involved at very low temperature ?. 14th EU-Japan Joint Symposium on Plasma Processing (JSPP) 2023, Satoshi Hamaguchi, Apr 2023, Okinawa, Japan, Japan. ⟨hal-04072312⟩
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Nombre de documents
77
Nombre de notices
277
Mots-clés
Mott insulator
Aryl-diazonium salts
Chemical detection
A Thin films
Amorphous
Films
Mott insulators
Applications industrielles
Selenization
Carbon nitride
B2 Quaternary
A1 Characterization
Alzheimer's disease
Plasma etching
Physical vapor deposition
Chalcogenides
Atomic force microscopy
A3 Physical vapor deposition processes
Sol-gel
A-CNx
TiO2
Oxides
Ablation laser
Buffer Couple
X-ray photoelectron spectroscopy
C Photoelectron spectroscopy
Copper
Carbon nanotubes
Atomic layer etching
AZO thin films
Transfert d'énergie
Bipolar resistive switching BRS
Thin films
Sputtering
Plasmas froids
Etching
Semiconductors
Nanocomposite
Residual stress
Band alignment
Amyloid precursor
Optical properties
B Chemical synthesis
NEXAFS
Chalcogenide glass
Non-volatile memory
Alloying
TEM
A Chalcogenides
Thin film
Structure
BOMBARDMENT
B1 Inorganic compounds
Cathepsin
Ambipolar material
Resistive switching
Biocapteurs
Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation
Biomasse
Carbon Nanotube
AuCu alloy
CaTiO3Pr^3^+
Bixbyite
V2O3
Aluminium nitride
Adsorption
CNTs’ collapse
Calcined clay
CH4
B2 Semiconducting alloys
Functionalization
AlN
Nanotubes
SF 6
Capacitance
XPS
B2 Semiconducting indium compounds
Kirkendall effect
CHLORINE PLASMAS
X-ray diffraction
Biofilms microbiens
Colloidal solution
B3 Solar cells
Chemical and biological sensors
Band gap
CIGSe
Anatase
Avalanche breakdown
Transmission electron microscopy
Chalcogenide
Titanium dioxide
PECVD
A Multilayers
Spectroscopic ellipsometry
3 nm in size
Magnetron sputtering
Carbon
Low-pressure plasma processing
Vanadium Sesquioxide
Scanning electron microscopy